Excimer laser in the context of Refractive surgery


Excimer laser in the context of Refractive surgery

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⭐ Core Definition: Excimer laser

An excimer laser, sometimes more correctly called an exciplex laser, is a form of ultraviolet laser which is commonly used in the production of microelectronic devices, semiconductor based integrated circuits or "chips", eye surgery, and micromachining.

Since the 1960s, excimer lasers have been widely used in high-resolution photolithography machines, one of the critical technologies required for microelectronic chip manufacturing.

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πŸ‘‰ Excimer laser in the context of Refractive surgery

Refractive surgery is an optional eye surgery used to improve the refractive state of the eye and thereby decrease or eliminate dependency on glasses or contact lenses. This can include various methods of surgical remodeling of the cornea (keratomileusis), lens implantation or lens replacement. The most common methods today use excimer lasers to reshape the curvature of the cornea. Refractive eye surgeries are used to treat common vision disorders such as myopia, hyperopia, presbyopia and astigmatism.

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Excimer laser in the context of Krypton

Krypton (from Ancient Greek: ΞΊΟΟ…Ο€Ο„ΟŒΟ‚, romanized:Β kryptos 'the hidden one') is a chemical element; it has symbol Kr and atomic number 36. It is a colorless, odorless noble gas that occurs in trace amounts in the atmosphere and is often used with other rare gases in fluorescent lamps. Krypton is chemically inert.

Krypton, like the other noble gases, is used in lighting and photography. Krypton light has many spectral lines, and krypton plasma is useful in bright, high-powered gas lasers (krypton ion and excimer lasers), each of which resonates and amplifies a single spectral line. Krypton fluoride also makes a useful laser medium. From 1960 to 1983, the official definition of the metre was based on the wavelength of one spectral line of krypton-86, because of the high power and relative ease of operation of krypton discharge tubes.

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Excimer laser in the context of Xenon

Xenon is a chemical element; it has symbol Xe and atomic number 54. It is a dense, colorless, odorless noble gas found in Earth's atmosphere in trace amounts. Although generally unreactive, it can undergo a few chemical reactions such as the formation of xenon hexafluoroplatinate, the first noble gas compound to be synthesized.

Xenon is used in flash lamps and arc lamps, and as a general anesthetic. The first excimer laser design used a xenon dimer molecule (Xe2) as the lasing medium, and the earliest laser designs used xenon flash lamps as pumps. Xenon is also used to search for hypothetical weakly interacting massive particles and as a propellant for ion thrusters in spacecraft.

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Excimer laser in the context of LASIK

LASIK or Lasik (/ˈleΙͺsΙͺk/; "laser-assisted in situ keratomileusis"), commonly referred to as laser eye surgery or laser vision correction, is a type of refractive surgery for the correction of myopia, hypermetropia, and astigmatism. LASIK surgery is performed by an ophthalmologist who uses a femtosecond laser or a microkeratome to create a corneal flap to expose the corneal stroma and then an excimer laser to reshape the corneal stroma in order to improve visual acuity.

LASIK is very similar to another surgical corrective procedure, photorefractive keratectomy (PRK), and LASEK. All represent advances over radial keratotomy in the surgical treatment of refractive errors of vision. For people with moderate to high myopia or thin corneas which cannot be treated with LASIK or PRK, the phakic intraocular lens is an alternative.

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Excimer laser in the context of Krypton fluoride laser

A krypton-fluoride laser (KrF laser) is a particular type of excimer laser, which is sometimes (more correctly) called an exciplex laser. With its 248 nanometer wavelength, it is a deep ultraviolet laser which is commonly used in the production of semiconductor integrated circuits, industrial micromachining, and scientific research. The term excimer is short for "excited dimer", while exciplex is short for "excited complex". An excimer laser typically contains a mixture of a noble gas, such as argon, krypton, or xenon, and a halogen gas such as fluorine or chlorine. Under suitably intense conditions of electromagnetic stimulation and pressure, the mixture emits a beam of coherent stimulated radiation as laser light in the ultraviolet range.

KrF and ArF excimer lasers are widely incorporated into high-resolution photolithography machines, one of the critical tools required for microelectronic chip manufacturing in nanometer dimensions. Excimer laser lithography has enabled transistor feature sizes to shrink from 800 nanometers in 1990 to 10 nanometers in 2016.

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