Semiconductor manufacturing in the context of "Ion implantation"

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⭐ Core Definition: Semiconductor manufacturing

Semiconductor device fabrication is the process used to manufacture semiconductor devices, typically integrated circuits (ICs) such as microprocessors, microcontrollers, and memories (such as RAM and flash memory). It is a multiple-step photolithographic and physico-chemical process (with steps such as thermal oxidation, thin-film deposition, ion implantation, etching) during which electronic circuits are gradually created on a wafer, typically made of pure single-crystal semiconducting material. Silicon is almost always used, but various compound semiconductors are used for specialized applications. Steps such as etching and photolithography can be used to manufacture other devices, such as LCD and OLED displays.

The fabrication process is performed in highly specialized semiconductor fabrication plants, also called foundries or "fabs", with the central part being the "clean room". In more advanced semiconductor devices, such as modern 14/10/7 nm nodes, fabrication can take up to 15 weeks, with 11–13 weeks being the industry average. Production in advanced fabrication facilities is completely automated, with automated material handling systems taking care of the transport of wafers from machine to machine.

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Semiconductor manufacturing in the context of Surface engineering

Surface engineering is the sub-discipline of materials science which deals with the surface of solid matter. It has applications to chemistry, mechanical engineering, and electrical engineering (particularly in relation to semiconductor manufacturing).

Solids are composed of a bulk material covered by a surface. The surface which bounds the bulk material is called the surface phase. It acts as an interface to the surrounding environment. The bulk material in a solid is called the bulk phase.

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Semiconductor manufacturing in the context of Microfabrication

Microfabrication is the process of fabricating miniature structures of micrometre scales and smaller. Historically, the earliest microfabrication processes were used for integrated circuit fabrication, also known as "semiconductor manufacturing" or "semiconductor device fabrication". In the last two decades, microelectromechanical systems (MEMS), microsystems (European usage), micromachines (Japanese terminology) and their subfields have re-used, adapted or extended microfabrication methods. These subfields include microfluidics/lab-on-a-chip, optical MEMS (also called MOEMS), RF MEMS, PowerMEMS, BioMEMS and their extension into nanoscale (for example NEMS, for nano electro mechanical systems). The production of flat-panel displays and solar cells also uses similar techniques.

Miniaturization of various devices presents challenges in many areas of science and engineering: physics, chemistry, materials science, computer science, ultra-precision engineering, fabrication processes, and equipment design. It is also giving rise to various kinds of interdisciplinary research. The major concepts and principles of microfabrication are microlithography, doping, thin films, etching, bonding, and polishing.

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Semiconductor manufacturing in the context of 7 nanometer

In semiconductor manufacturing, the "7 nm" process is a term for the MOSFET technology node following the "10 nm" node, defined by the International Roadmap for Devices and Systems (IRDS), which was preceded by the International Technology Roadmap for Semiconductors (ITRS). It is based on FinFET (fin field-effect transistor) technology, a type of multi-gate MOSFET technology.

As of 2021, the IRDS Lithography standard gives a table of dimensions for the "7 nm" node, with examples given below:

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